SU-8 Negative Epoxy Resists

Kayaku Advanced Materials, Inc. epoxy resists consist of chemically amplified, epoxy-based negative resists that are highly functional, and photo-imageable to near UV (365nm) radiation. Cured films or microstructures are very resistant to solvents, acids and bases and have excellent thermal and mechanical stability, making them well suited for fabricating permanent structures such as pixel walls, fluidic channels and nozzles, micro arrays and spacers.

Epoxy Resists	Features	UV Sensitivity	Film Thickness (optimum)	Resolution
SU-8	Wide range of viscosities High aspect ratio patterning Photo-definable ultra-thick structures	i-line	10-200 µm	>10:1 Aspect Ratio
SU-8 2000	Improved substrate wetting Faster drying Higher process throughput	i-line	10-100 µm	>10:1 Aspect Ratio
SU-8 3000	Improved substrate adhesion Reduced coating stress	i-line	10-70 µm	>5:1 Aspect Ratio
SU-8 TF 6000	High resolution thin film processing Highly uniform thin films Improved substrate adhesion	g-, h-, i-line	0.5-10 µm	High re

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